Optical detection of CH3 during diamond chemical vapor deposition

D. G. Goodwin, N. G. Glumac, E. J. Corat

Research output: Contribution to journalConference articlepeer-review

Abstract

Measurements of CH3 have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filamentassisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in a 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH4, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.

Original languageEnglish (US)
Pages (from-to)292-298
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2124
DOIs
StatePublished - Jun 17 1994
Externally publishedYes
EventLaser Techniques for State-Selected and State-to-State Chemistry II 1994 - Los Angeles, United States
Duration: Jan 23 1994Jan 29 1994

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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