Optical detection of CH3 during diamond chemical vapor deposition

D. G. Goodwin; N. G. Glumac; E. J. Corat

doi:10.1117/12.178103

Optical detection of CH₃ during diamond chemical vapor deposition

D. G. Goodwin, N. G. Glumac, E. J. Corat

Research output: Contribution to journal › Conference article › peer-review

Abstract

Measurements of CH₃ have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filamentassisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in a 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH₄, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.

Original language	English (US)
Pages (from-to)	292-298
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2124
DOIs	https://doi.org/10.1117/12.178103
State	Published - Jun 17 1994
Externally published	Yes
Event	Laser Techniques for State-Selected and State-to-State Chemistry II 1994 - Los Angeles, United States Duration: Jan 23 1994 → Jan 29 1994

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Online availability

10.1117/12.178103

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Cite this

@article{38fb41c9a29c435f85738790a50bfd78,

title = "Optical detection of CH3 during diamond chemical vapor deposition",

abstract = "Measurements of CH3 have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filamentassisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in a 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH4, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.",

author = "Goodwin, {D. G.} and Glumac, {N. G.} and Corat, {E. J.}",

note = "Funding Information: This work has been supported, in part, by the National Science Foundation under Grant CTS-9057921 and by the Office of Naval Research, under contract N00014-90-J-1386. An additional equipment grant from the AT&T Foundation is gratefully acknowledged. Publisher Copyright: {\textcopyright} 1994 SPIE. All rights reserved.; Laser Techniques for State-Selected and State-to-State Chemistry II 1994 ; Conference date: 23-01-1994 Through 29-01-1994",

year = "1994",

month = jun,

day = "17",

doi = "10.1117/12.178103",

language = "English (US)",

volume = "2124",

pages = "292--298",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

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}

TY - JOUR

T1 - Optical detection of CH3 during diamond chemical vapor deposition

AU - Goodwin, D. G.

AU - Glumac, N. G.

AU - Corat, E. J.

N1 - Funding Information: This work has been supported, in part, by the National Science Foundation under Grant CTS-9057921 and by the Office of Naval Research, under contract N00014-90-J-1386. An additional equipment grant from the AT&T Foundation is gratefully acknowledged. Publisher Copyright: © 1994 SPIE. All rights reserved.

PY - 1994/6/17

Y1 - 1994/6/17

N2 - Measurements of CH3 have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filamentassisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in a 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH4, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.

AB - Measurements of CH3 have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filamentassisted reactor, which show that the CH3 concentration is depleted near the substrate. The CH3 concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in a 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH4, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.

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