On the incorporation of arsenic (As) in GaN films by conventional MOCVD

X. Li, S. Kim, S. G. Bishop, J. J. Coleman

Research output: Contribution to journalConference articlepeer-review


Arsenic was incorporated in GaN films by atmospheric pressure metalorganic chemical vapor deposition (MOCVD) using AsH3 and NH3 as the As and N sources. The optimum growth condition for the doping of As in order to produce strong luminescence at a characteristic emission wavelength (approximately 480 nm) was determined. The characteristic emission is attributed to excitons bound at As isoelectronic impurities.

Original languageEnglish (US)
Number of pages1
JournalLEOS Summer Topical Meeting
StatePublished - Jan 1 1997
EventProceedings of the 1997 LEOS Summer Topical Meeting - Montreal, Can
Duration: Aug 11 1997Aug 15 1997

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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