On mask layout partitioning for electron projection lithography

Ruiqi Tian, Ronggang Yu, Xiaoping Tang, D. F. Wong

Research output: Contribution to journalConference articlepeer-review

Abstract

Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results.

Original languageEnglish (US)
Pages (from-to)514-518
Number of pages5
JournalIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
DOIs
StatePublished - Dec 1 2002
EventIEEE/ACM International Conference on Computer Aided Design (ICCAD) - San Jose, CA, United States
Duration: Nov 10 2002Nov 14 2002

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

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