Abstract
We present on-chip intra- and inter-layer grating couplers fabricated on double-layer, single crystalline silicon nanomembranes. The silicon nanomembranes were fabricated using an adhesive bonding process. The grating couplers are based on subwavelength nanostructures operating at the transverse-electric polarization. Such nanostructures can be patterned in a single lithography/etching process. Simultaneous intra-layer coupling to separate silicon photonic layers is demonstrated through grating couplers with peak efficiencies of 18% and 44% per grating coupler for bottom and top layer, respectively, at 1550 nm wavelength. The inter-layer grating coupler has an efficiency of 25% at 1560 nm wavelength with a 3 dB bandwidth of 41 nm.
Original language | English (US) |
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Article number | 211109 |
Journal | Applied Physics Letters |
Volume | 102 |
Issue number | 21 |
DOIs | |
State | Published - May 27 2013 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)