@inproceedings{e448f97a517f4be2b52e7e4620fb4670,
title = "Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays",
abstract = "We report a top-down fabrication method that involves the combination of superionic-solid-statestamping (S4) patterning with metal-assisted-chemical- etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.",
author = "W. Chern and K. Hsu and I. Chun and B. Azeredo and N. Fang and P. Ferreira and X. Li",
year = "2010",
language = "English (US)",
isbn = "9781557528902",
series = "Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010",
booktitle = "Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference",
note = "Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010 ; Conference date: 16-05-2010 Through 21-05-2010",
}