New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

Keyphrases

• Superconformal 100%
• Low Temperature Chemical Vapor Deposition 100%
• Ultrasmooth Films 100%
• Site Blocking 66%
• Conformal Coverage 66%
• Low Temperature 33%
• Substrate Surface 33%
• Film Growth 33%
• Kinetic Model 33%
• Surface Sites 33%
• Oxide Surfaces 33%
• Metal-metal Oxide 33%
• Deep Trench 33%
• Selective Area Growth 33%
• Hydroxyl 33%
• Partial Pressure 33%
• Area-selective 33%
• Innovative Approach 33%
• Precursor Molecules 33%
• Neutral Molecules 33%
• Growth Areas 33%
• V-shaped 33%
• Non-conformal 33%
• Ultra-smooth 33%
• Low Substrate Temperature 33%
• Growth of Variety 33%
• High Aspect Ratio Features 33%
• Precursor Chemistry 33%
• New Precursor 33%
• Zone Diagram 33%
• Chemical Design 33%
• Metal Diborides 33%

Material Science

• Film 100%
• Chemical Vapor Deposition 100%
• Metal Oxide 20%
• Nucleation 20%
• Transition Metal 20%
• Film Growth 20%
• Oxide Surface 20%
• Growth (Materials) 20%