Nanowear of Hafnium Diboride thin films

Abhishek Chatterjee, Navneet Kumar, John R. Abelson, Pascal Bellon, Andreas A. Polycarpou

Research output: Contribution to journalArticlepeer-review

Abstract

Chemical Vapor Deposition-grown HfB2 films were subjected to nanowear testing at normal loads of 50-500 μN. The material response was investigated by measuring residual wear depths and wear scar roughness and by calculating wear rates and specific energies. Films annealed for 1 h at 800° C showed significant reduction in wear rate and required a higher critical energy for wear, compared to as-deposited HfB2 films. Analysis of roughness of the worn scars revealed that plowing effect dominates at higher loads (200-500 μN), whereas at lower loads, asperity flattening dominates. The excellent response of annealed HfB2 films to nanotribological testing demonstrates the poten1tial of these films for applications requiring high wear resistance at the nanoscale.

Original languageEnglish (US)
Pages (from-to)731-738
Number of pages8
JournalTribology Transactions
Volume53
Issue number5
DOIs
StatePublished - Sep 2010

Keywords

  • AFM
  • Coatings
  • HfB
  • Nanowear
  • Surface Roughness

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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