Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

Xiaoyuan Hu; David G. Cahill; Robert S. Averback

doi:10.1063/1.126633

Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

Xiaoyuan Hu, David G. Cahill, Robert S. Averback

Research output: Contribution to journal › Article

Abstract

Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO₂ substrates and subsequently bombarded by 800 keV Kr⁺. Ion doses of >2 × 10¹⁴ initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 10¹⁶ cm^-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr⁺ impacts.

Original language	English (US)
Pages (from-to)	3215-3217
Number of pages	3
Journal	Applied Physics Letters
Volume	76
Issue number	22
DOIs	https://doi.org/10.1063/1.126633
State	Published - May 29 2000

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.126633

Fingerprint Dive into the research topics of 'Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting'. Together they form a unique fingerprint.

Cite this

@article{b77139cf98274f84843849dcdd8b054f,

title = "Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting",

abstract = "Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of >2 × 1014 initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 1016 cm-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts.",

author = "Xiaoyuan Hu and Cahill, {David G.} and Averback, {Robert S.}",

year = "2000",

month = may,

day = "29",

doi = "10.1063/1.126633",

language = "English (US)",

volume = "76",

pages = "3215--3217",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "22",

}

TY - JOUR

T1 - Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

AU - Hu, Xiaoyuan

AU - Cahill, David G.

AU - Averback, Robert S.

PY - 2000/5/29

Y1 - 2000/5/29

N2 - Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of >2 × 1014 initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 1016 cm-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts.

AB - Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of >2 × 1014 initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 1016 cm-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts.

UR - http://www.scopus.com/inward/record.url?scp=0000109534&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000109534&partnerID=8YFLogxK

U2 - 10.1063/1.126633

DO - 10.1063/1.126633

M3 - Article

AN - SCOPUS:0000109534

VL - 76

SP - 3215

EP - 3217

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 22

ER -