Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

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Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of >2 × 1014 initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 1016 cm-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts.

Original languageEnglish (US)
Pages (from-to)3215-3217
Number of pages3
JournalApplied Physics Letters
Issue number22
StatePublished - May 29 2000

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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