Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 mn thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of >2 × 1014 initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, ( ∼2× 1016 cm-2), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)