Abstract
The present disclosure provides a method of fabricating a nanoporous thin film device comprising depositing a template on a substrate to form a nanoporous insulating layer, the template comprising one or more polymers capable of forming pores when polymerized and at least one cross-linking agent, and depositing a second layer (e.g. organic semiconductor, semiconductor, insulator) on the nonporous insulating layer to form a thin film having a plurality of isolated nanopores on the surface. Nanoporous semiconductor thin films made by these methods is provided. Sensors and devices comprising the nanoporous thin film is also disclosed.
| Original language | English (US) |
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| U.S. patent number | 10845328 |
| State | Published - Nov 24 2020 |