Abstract
We present a technique to fabricate nano wires on silicon substrates without any lithography. The wires are 50 nm or less in width, but their lengths can be 10s of micro meters. They can be formed by a single or multiple layers of metals. The wires can be designed to form a network which can be partially released from the substrate to form 3D structures. Such structures may serve as actuators or sensors.
Original language | English (US) |
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Pages | 45-47 |
Number of pages | 3 |
State | Published - 2003 |
Event | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan Duration: Jan 19 2003 → Jan 23 2003 |
Other
Other | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems |
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Country/Territory | Japan |
City | Kyoto |
Period | 1/19/03 → 1/23/03 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Mechanical Engineering
- Electrical and Electronic Engineering