Abstract
Consideration is given to a class of image models based on random geometric processes. Theoretical and empirical results on properties of patterns generated using these models are summarized. These properties can be used as aids in fitting the models to images.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 66-70 |
| Number of pages | 5 |
| Journal | Proceedings of the IEEE Conference on Decision and Control |
| Volume | 1 |
| DOIs | |
| State | Published - 1979 |
| Externally published | Yes |
| Event | Proc IEEE Conf Decis Control Incl Symp Adapt Processes 18th - Fort Lauderdale, FL, USA Duration: Dec 12 1979 → Dec 14 1979 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Modeling and Simulation
- Control and Optimization