Molecular beam epitaxy of layered Dy-Ba-Cu-O compounds

D. G. Schlom, J. N. Eckstein, E. S. Hellman, S. K. Streiffer, J. S. Harris, M. R. Beasley, J. C. Bravman, T. H. Geballe, C. Webb, K. E. Von Dessonneck, F. Turner

Research output: Contribution to journalArticlepeer-review

Abstract

Heteroepitaxial Dy-Ba-Cu-O films have been grown in situ on SrTiO 3 substrates using an oxygen plasma beam and elemental source beams in a modified molecular beam epitaxy machine. By periodically shuttering the Dy and Ba beams during growth, flat surfaces of layered Dy-Ba-Cu-O compounds have been obtained. Periodic oscillations in the intensity of the in situ reflection high-energy electron diffraction pattern were observed during shuttered growths. Depending on growth conditions, the as-grown layers have ranged from insulating to superconducting with onset temperatures above 60 K.

Original languageEnglish (US)
Pages (from-to)1660-1662
Number of pages3
JournalApplied Physics Letters
Volume53
Issue number17
DOIs
StatePublished - Dec 1 1988
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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