Molded transparent photopolymers and phase shift optics for fabricating three dimensional nanostructures

Seokwoo Jeon, Daniel J. Shir, Yun Suk Nam, Robert Nidetz, Matthew Highland, David G. Cahill, John A. Rogers, Mehmet F. Su, Ihab F. El-Kady, Christos G. Christodoulou, Gregory R. Bogart

Research output: Contribution to journalArticlepeer-review


This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. These approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.

Original languageEnglish (US)
Pages (from-to)6358-6366
Number of pages9
JournalOptics Express
Issue number10
StatePublished - May 14 2007

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


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