Modeling and simulation of coupled lossy lines for VLSI interconnections

O. A. Palusinski, A. C. Cangellaris, J. L. Prince, J. C. Liao, L. Vakanis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The authors present techniques for the analysis of signal propagation in the interconnections used in VLSI systems. The propagation is modelled by coupled transmission lines which include losses. For conductors whose thickness is small compared to the skin depth over the principal spectrum of the pulse being propagated, the losses can be treated as frequency-independent; otherwise, the losses must be calculated as a function of frequency. It was observed that the inductance may be approximately treated as constant, but the resistance variations in frequency may be significant. A semianalytical method for computing the transients in lossy lines serves as the basis for the simulation of nonuniform lines.

Original languageEnglish (US)
Title of host publication1988 IEEE Int Conf Comput Des VLSI Comput Process ICCD 88 Proc
PublisherPubl by IEEE
Pages82-86
Number of pages5
ISBN (Print)0818608722
StatePublished - 1988
Externally publishedYes

Publication series

Name1988 IEEE Int Conf Comput Des VLSI Comput Process ICCD 88 Proc

ASJC Scopus subject areas

  • Engineering(all)

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