Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

John R. Sporre, Daniel T. Elg, Kishor K. Kalathiparambil, David N Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation.

Original languageEnglish (US)
Article number013503
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Volume15
Issue number1
DOIs
StatePublished - Jan 1 2016

Keywords

  • Monte Carlo
  • debris mitigation
  • elastic scattering
  • extreme ultraviolet
  • intermediate focus

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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