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Model-based multiple patterning layout decomposition
Daifeng Guo
, Haitong Tian
, Yuelin Du
,
Martin D.F. Wong
Electrical and Computer Engineering
Research output
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Chapter in Book/Report/Conference proceeding
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Keyphrases
Adjacent Features
20%
Computational Resources
20%
Corresponding Features
20%
Decomposition Approach
20%
Decomposition Method
20%
Distance Threshold Value
20%
Dmin
20%
Double Patterning Lithography
60%
Expander Graphs
20%
Geometric Distance
20%
Graph Algorithms
20%
Graph Coloring
40%
Large Volume
20%
Layout Decomposition
100%
Layout Features
20%
Layout Pattern
20%
Lithography
20%
Lithography Technology
20%
Mask Design
20%
Media Exposure
20%
Minimum Constraints
20%
Minimum Distance
40%
Model-based Approach
20%
Multiple Patterning Lithography
60%
Multiple Patterns
100%
Next Generation Lithography
20%
Optical Simulation
20%
Optical Source
20%
Optics
20%
Optimal Decomposition
20%
Polygon
60%
Rule-based
40%
Simulation Model
20%
Source Characteristics
20%
Standard Graphs
20%
Suboptimal Solutions
20%
Technology Node
20%
Triple Patterning Lithography
60%
Wafer
20%
Computer Science
Classical Graph
50%
Computational Resource
50%
Decomposition Method
50%
Distance Threshold
50%
Geometric Distance
50%
Graph Algorithms
50%
Graph Coloring
100%
Simplified Assumption
50%
Simulation Model
50%
Mathematics
Decomposition Method
33%
Edge
66%
Graph Algorithm
33%
Graph Coloring
66%
Polygon
100%
Simulation Model
33%
Engineering
Computational Resource
9%
Feature Size
9%
Lithography
100%
Nodes
9%
Optical Source
9%
Simulation Model
9%
Simulation Result
9%
Source Characteristic
9%