Microstructure and electronic properties of thin film nanoporous silica as a function of processing and annealing methods

Christine Caragianis-Broadbridge, John R. Miecznikowski, Wenjuan Zhu, Zhijiong Luo, Jin Ping Han, Ann Hein Lehman

Research output: Contribution to journalArticlepeer-review

Abstract

Alcogels, aerogel precursors, were prepared by hydrolysis and condensation of the metal alkoxide tetraethylorthosilicate and were catalyzed by both acids and bases, according to a standard reaction. Alcogel solution was spin coated onto p-type silicon wafers and fluid extraction was achieved in an uncontrolled (room temperature, atmospheric pressure) environment. Film porosity was retained through surface modification and/or low vapor pressure solvent techniques. The microstructure and electronic properties of the resulting films were evaluated using non-contact atomic force microscopy (nc-AFM), cross sectional scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Metal insulator semiconductor (MIS) devices were prepared and current-voltage and capacitance-voltage measurements were obtained from these devices. Annealing studies reveal a dramatic temperature dependent effect on both the microstructure and electronic properties of the porous silica films.

Original languageEnglish (US)
Pages (from-to)D5161-D5166
JournalMaterials Research Society Symposium-Proceedings
Volume612
StatePublished - Jan 1 2000
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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