Microstructural investigation on the interfacial evolution of SnBi/Cu interconnect during reflow and solid-state aging

Zhi Quan Liu, Pan Ju Shang, Xue Yong Pang, Jian Ku Shang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The microstructures of SnBi/Cu interconnect after reflow and its evolution during solid-state aging at 393K were investigated using transmission electron microscopy (TEM). It was found that after reflow there were two kinds of intermetallic compounds (IMCs) - Cu6Sn5 and Cu 3Sn in solder joint. Above these IMC layers there was a Bi-rich layer which consisted of discontinuous Bi particles. During solid state aging, the Cu3Sn phase grew faster into Cu substrate than into Cu 6Sn5, and the Bi-rich layer did not change much. However, new Bi particles were observed at the Cu3Sn/Cu interface, which introduced interfacial voids around Bi particles. First principles calculation revealed that Bi segregation reduced the adhesion energy of Cu/Cu3Sn interface and caused serious reliability problem.

Original languageEnglish (US)
Title of host publicationProceedings, 2008 International Conference on Electronic Packaging Technology and High Density Packaging, ICEPT-HDP 2008
DOIs
StatePublished - 2008
Externally publishedYes
Event2008 International Conference on Electronic Packaging Technology and High Density Packaging, ICEPT-HDP 2008 - Pudong, Shanghai, China
Duration: Jul 28 2008Jul 31 2008

Publication series

NameProceedings, 2008 International Conference on Electronic Packaging Technology and High Density Packaging, ICEPT-HDP 2008

Other

Other2008 International Conference on Electronic Packaging Technology and High Density Packaging, ICEPT-HDP 2008
Country/TerritoryChina
CityPudong, Shanghai
Period7/28/087/31/08

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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