TY - JOUR
T1 - Microplasmas for Advanced Materials and Devices
AU - Chiang, Wei Hung
AU - Mariotti, Davide
AU - Sankaran, R. Mohan
AU - Eden, J. Gary
AU - Ostrikov, Kostya
N1 - Funding Information:
The authors greatly appreciate the efforts of all researchers who have worked in any of the relevant areas and apologize if any of contributions were not included due to specific focus and size limits of this article. W.-H.C. acknowledges the support of the Ministry of Science and Technology (MOST) of Taiwan (under grant no. MOST 107-2628-E-011-002-MY3). D.M. acknowledges the support of EPSRC funding through EP/M024938/1, EP/M015211/1, EP/R023638/1, and EP/R008841/1. R.M.S. acknowledges the support of the Department of Energy under grant no. DE-SC0018202. J.G.E. thanks P. P. Sun, J. H. Cho, S.-J. Park, and C. M. Herring for valuable discussions, and acknowledges the support of the U.S. Air Force Office of Scientific Research under grant no. FA9550-14-1-0002. K.O. thanks the Australian Research Council for partial support.
Publisher Copyright:
© 2019 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2020/5/1
Y1 - 2020/5/1
N2 - Microplasmas are low-temperature plasmas that feature microscale dimensions and a unique high-energy-density and a nonequilibrium reactive environment, which makes them promising for the fabrication of advanced nanomaterials and devices for diverse applications. Here, recent microplasma applications are examined, spanning from high-throughput, printing-technology-compatible synthesis of nanocrystalline particles of common materials types, to water purification and optoelectronic devices. Microplasmas combined with gaseous and/or liquid media at low temperatures and atmospheric pressure open new ways to form advanced functional materials and devices. Specific examples include gas-phase, substrate-free, plasma-liquid, and surface-supported synthesis of metallic, semiconducting, metal oxide, and carbon-based nanomaterials. Representative applications of microplasmas of particular importance to materials science and technology include light sources for multipurpose, efficient VUV/UV light sources for photochemical materials processing and spectroscopic materials analysis, surface disinfection, water purification, active electromagnetic devices based on artificial microplasma optical materials, and other devices and systems including the plasma transistor. The current limitations and future opportunities for microplasma applications in materials related fields are highlighted.
AB - Microplasmas are low-temperature plasmas that feature microscale dimensions and a unique high-energy-density and a nonequilibrium reactive environment, which makes them promising for the fabrication of advanced nanomaterials and devices for diverse applications. Here, recent microplasma applications are examined, spanning from high-throughput, printing-technology-compatible synthesis of nanocrystalline particles of common materials types, to water purification and optoelectronic devices. Microplasmas combined with gaseous and/or liquid media at low temperatures and atmospheric pressure open new ways to form advanced functional materials and devices. Specific examples include gas-phase, substrate-free, plasma-liquid, and surface-supported synthesis of metallic, semiconducting, metal oxide, and carbon-based nanomaterials. Representative applications of microplasmas of particular importance to materials science and technology include light sources for multipurpose, efficient VUV/UV light sources for photochemical materials processing and spectroscopic materials analysis, surface disinfection, water purification, active electromagnetic devices based on artificial microplasma optical materials, and other devices and systems including the plasma transistor. The current limitations and future opportunities for microplasma applications in materials related fields are highlighted.
KW - materials and devices
KW - microplasmas
KW - nanomaterials
KW - nanoscale synthesis
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U2 - 10.1002/adma.201905508
DO - 10.1002/adma.201905508
M3 - Review article
C2 - 31854023
AN - SCOPUS:85077027509
SN - 0935-9648
VL - 32
JO - Advanced Materials
JF - Advanced Materials
IS - 18
M1 - 1905508
ER -