Abstract
A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be conducted. Once separated, various methods may be employed to form nanoparticles into colloids, crystals, films and other desirable forms. The particles may also be coated or doped.
Original language | English (US) |
---|---|
U.S. patent number | 6585947 |
Filing date | 10/22/99 |
State | Published - Jul 1 2003 |