Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Copper(II) Oxide
100%
Copper(I)
100%
Tert-butoxide
100%
Copper Metal
57%
T-butyl Alcohol
28%
Product Distribution
28%
Oxide Phase
28%
Isobutylene
28%
Single Crystal
14%
Cu(111)
14%
Ultra-high Vacuum
14%
Metal Cans
14%
Pure Metals
14%
Surface Binding
14%
Hydroxide
14%
Temperature Programmed Desorption
14%
High-resolution Electron Energy Loss Spectroscopy (HREELS)
14%
High Surface Area
14%
Metal Film
14%
Desorption Study
14%
Oxide Metal
14%
X-ray Powder Diffraction
14%
Pure Copper
14%
Oxygen Contamination
14%
Yield Surface
14%
Proton Transfer Mechanism
14%
Whisker
14%
Intermediate Oxides
14%
Distribution Studies
14%
Chemistry
Metal-Organic Chemical Vapor Deposition
100%
Product Distribution
50%
Butene
50%
Surface Area
25%
Single Crystalline Solid
25%
Desorption
25%
Proton Transfer
25%
Transfer Process
25%
High Resolution Electron Energy Loss Spectroscopy
25%
Powder X-Ray Diffractometry
25%
Material Science
Oxide Compound
100%
Metal-Organic Chemical Vapor Deposition
100%
Film
12%
Desorption
12%
Metal Film
12%
Transfer Process
12%
X Ray Powder Diffraction
12%
High Resolution Electron Energy Loss Spectroscopy
12%
Yield Surface
12%
Surface (Surface Science)
12%
Single Crystal
12%