Metal complex compositions and methods for making metal-containing films

Gregory S Girolami (Inventor), Do Young Kim (Inventor), John R Abelson (Inventor), Navneet Kumar (Inventor), Yu Yang (Inventor), Scott Daly (Inventor)

Research output: Patent

Abstract

The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.
Original languageEnglish (US)
U.S. patent number8362220
StatePublished - Jan 29 2013

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