Metal complex compositions and methods for making metal-containing films

Scott Daly (Inventor), Sreenivas Jayaraman (Inventor), John R Abelson (Inventor), Gregory S Girolami (Inventor), Yu Yang (Inventor), Navneet Kumar (Inventor), Do Young Kim (Inventor)

Research output: Patent


The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.
Original languageEnglish (US)
U.S. patent number8362220
Filing date4/9/08
StatePublished - Jan 29 2013


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