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Metal-assisted chemical etching in HF/H
2
O
2
produces porous silicon
X. Li
, P. W. Bonn
Electrical and Computer Engineering
Research output
:
Contribution to journal
›
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›
peer-review
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Dive into the research topics of 'Metal-assisted chemical etching in HF/H
2
O
2
produces porous silicon'. Together they form a unique fingerprint.
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Keyphrases
Hydrogen Peroxide
100%
Porous Silicon
100%
Metal-assisted Chemical Etching
100%
In Situ
16%
Effective Method
16%
Etching Rate
16%
Etching Process
16%
Luminescence
16%
Doping Level
16%
Metal Coatings
16%
Si Surface
16%
Light-emitting
16%
Redox Reaction
16%
AuPd
16%
Reaction Scheme
16%
Thin Elements
16%
Pt-Pd
16%
AuPt
16%
Electrical Current
16%
Si Doping
16%
Local Coupling
16%
Doping Type
16%
Silicon Production
16%
Porous Silicon Layer
16%
Light Emitting Properties
16%
Material Science
Hydrogen Peroxide
100%
Porous Silicon
100%
Surface (Surface Science)
28%
Luminescence
14%
Redox Process
14%
Metal Coating
14%