Mechanism and kinetics of near-surface dopant pile-up during post-implant annealing

Prashun Gorai, Yevgeniy V. Kondratenko, Edmund G. Seebauer

Research output: Contribution to journalArticlepeer-review

Abstract

Dopant pile-up within 1-2 nm of Si/SiO 2 interfaces during post-implant annealing can influence the performance of microelectronic devices using silicon-on-insulator technology or super-steep retrograde channels. Pile-up results from changes in the dopant interstitial charge state induced by band bending at the interface. But, there exists little mechanistic understanding of the specific conditions needed for pile-up or of the kinetics of temporal evolution. The present work uses continuum simulations coupled with experiments in the case of B implanted into Si to show that pile-up requires a zone near the interface wherein the Fermi level exceeds the ionization level for dopant interstitials to change their charge state. The spatial extent of pile-up corresponds closely to the width of this zone unless the annihilation probability of defects at the interface is large. The time and temperature dependences of pile-up closely track those of the free dopant interstitials concentration.

Original languageEnglish (US)
Article number094510
JournalJournal of Applied Physics
Volume111
Issue number9
DOIs
StatePublished - May 1 2012

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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