Measurements of time varying plasma potential, temperature, and density in A13.56 MHz radio-frequency discharge

L. Jeffrey, B. O. Wilson, C. Caughman, Phi Long Nguyen, D. N. Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

Argon plasma measurements were conducted in a commercial capacitively coupled etcher operating at 400 mTorr with 60-W coupled power at 13.56 MHz. Time varying floating potential was measured using a capacitively coupled probe which uses a capacitive voltage divider and a field effect transistor buffer amplifier. Average floating potential was obtained from a high- input-impedance Langmuir probe. The floating potential was found to be sinusoidal, [21 sin(ωt) — 4] V± 1.5 V, with a maximum of 17 ± 1.5 V and a minimum of — 25 ± 1.5 V. From these data and the use of a low-input-impedance Langmuir probe, a calibrated instantaneous I-V characteristic is used to obtain plasma potential and electron temperature. Plasma potential was found to be sinusoidal, [21 sin(ωt) + 30] V± 1.6 V, with a maximum of 51 ± 1.6 Vanda minimum of 9 ± 1.6 V. Electron temperatures were 6.58 ±0.19 eV at maximum plasma potential and 6.49 ± 0.19 eV at minimum plasma potential. The electron density for this experiment was determined to be 1.48 ± 0.83 X 1010 electrons/cm3.

Original languageEnglish (US)
Pages (from-to)972-976
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume7
Issue number3
DOIs
StatePublished - May 1989

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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