A new method to measure Debye Waller factors is reported in this article. The specimen analyzed is TiAl which was thinned by twin jet electropolishing. The measurement of the factors is necessary for the structure factor refinement in TiAl. It is aimed to get CBED pattern near a sparse zone axis, to extract line scans along HOLZ lines from the pattern. Two beam intensity is calculated to fit experiment and simulation by Debye Waller factor variations.
|Original language||English (US)|
|Number of pages||2|
|Journal||Proceedings - Annual Meeting, Microscopy Society of America|
|State||Published - Dec 1 1993|
|Event||Proceedings of the 51st Annual Meeting Microscopy Society of America - Cincinnati, OH, USA|
Duration: Aug 1 1993 → Aug 6 1993
ASJC Scopus subject areas