Keyphrases
Rutile
100%
Measurement Method
100%
Carrier Concentration
100%
Mott-Schottky
100%
Cr-Mn
75%
Atomic Layer Deposition
50%
Undoped
50%
Free Carrier Concentration
25%
Crystallinity
25%
Source Material
25%
Chemical Composition
25%
Device Performance
25%
Doping Level
25%
Influence Factors
25%
N-doping
25%
Metrology
25%
Substrate Type
25%
Integrated Circuits
25%
Ti-O
25%
Metal Surface
25%
Metal Oxide Semiconductor
25%
Possible Causes
25%
Ti-Cr
25%
NiTiNb
25%
Mn-doped
25%
Concentration Value
25%
Capacitance-voltage Measurements
25%
Schottky Diode
25%
Doped Metal Oxides
25%
Dye-sensitized Solar Cells
25%
TiO2 Doping
25%
Contact Metal
25%
Circuit Application
25%
Metal Type
25%
Photocatalyst
25%
Solar Sensor
25%
Anatase TiO2
25%
Charge Carrier Concentration
25%
Mn-doped TiO2
25%
N-doped TiO2
25%
Material Science
Carrier Concentration
100%
Titanium Dioxide
100%
Titanium Oxide
33%
Electronic Circuit
16%
Silicon
16%
Metal Oxide
16%
Charge Carrier
16%
Oxide Semiconductor
16%
Capacitance
16%
Schottky Diode
16%
Type Metal
16%
Dye-Sensitized Solar Cell
16%
Photocatalysts
16%
Surface (Surface Science)
16%
Engineering
Carrier Concentration
100%
Atomic Layer Deposition
33%
Polycrystalline
16%
Source Material
16%
Metal Contact
16%
Crystallinity
16%
Device Performance
16%
Doping Level
16%
Metal Oxide Semiconductor
16%
Dye-Sensitized Solar Cell
16%
Photocatalysts
16%
Integrated Circuit
16%
Charge Carrier
16%
Electrical Measurement
16%