Mass-loaded cantilevers with suppressed higher-order modes for magnetic resonance force microscopy

B. W. Chui, Y. Hishinuma, R. Budakian, H. J. Mamin, T. W. Kenny, D. Rugar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We describe the design, fabrication and testing of mass-loaded cantilevers for electron-spin magnetic resonance force microscopy. These single-crystal silicon cantilevers are designed to have large gaps in their thermal mode spectra so as to reduce thermal noise near the electron-spin Rabi frequency. Each cantilever typically consists of a 2 μm thick mass suspended at the end of a 0.1 μm thick hinge. The fabrication process starts with an SOI wafer followed by selective silicon epitaxy, cantilever patterning, and backside release. The focus of the process is on precise thickness control and material homogeneity. We will present characterization results for these cantilevers at room and low temperatures and discuss the impact of these devices on magnetic resonance force microscopy measurements.

Original languageEnglish (US)
Title of host publicationTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1120-1123
Number of pages4
ISBN (Electronic)0780377311, 9780780377318
DOIs
StatePublished - 2003
Externally publishedYes
Event12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers - Boston, United States
Duration: Jun 8 2003Jun 12 2003

Publication series

NameTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
Volume2

Other

Other12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers
Country/TerritoryUnited States
CityBoston
Period6/8/036/12/03

Keywords

  • Electron microscopy
  • Fabrication
  • Force measurement
  • Frequency
  • Magnetic force microscopy
  • Magnetic noise
  • Magnetic resonance
  • Noise reduction
  • Silicon
  • Testing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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