@inproceedings{32e36986060b4bc8b27e18f3f32b5bc7,
title = "Magnetic mitigation of debris for EUV sources",
abstract = "Extreme Ultraviolet (EUV) lithography sources expel high-energy ions and neutral particles, which degrade the quality of the collector optic. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. The use of magnetic fields to deflect ionic debris has been proposed and is investigated here. In this paper, we present a detailed computational model of magnetic mitigation, along with experimental results that confirm the correctness of the model. Using a strong permanent magnet, it is experimentally shown that, using high enough fields, magnetic mitigation can be a successful method of deflecting ionic debris from an EUV source. For example, through an orifice centered at 0° from the pinch, we saw a flux of 1.65x108 +/- 1.5x107 ions/(m 2*pulse*eV) of 4keV ions without deflection and a negligible flux with deflection. With the orifice at a 35° angle from the pinch, a negligible 4keV flux was seen without deflection. However, with magnetic deflection, a 4keV flux of 1.03x108 +/- 9.4x106 ions/(m 2*pulse*eV) were seen. The half-angle spread of the orifice was .047° with a tolerance of 008°",
keywords = "Collector, Debris, Magnetic mitigation, Optic",
author = "D. Elg and J. Sporre and D. Curreli and Ruzic, {D. N.} and Umstadter, {K. R.}",
year = "2013",
doi = "10.1117/12.2011519",
language = "English (US)",
isbn = "9780819494610",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography IV",
note = "Extreme Ultraviolet (EUV) Lithography IV ; Conference date: 25-02-2013 Through 28-02-2013",
}