Magnetic mitigation of debris for EUV sources

D. Elg, J. Sporre, D. Curreli, D. N. Ruzic, K. R. Umstadter

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Extreme Ultraviolet (EUV) lithography sources expel high-energy ions and neutral particles, which degrade the quality of the collector optic. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. The use of magnetic fields to deflect ionic debris has been proposed and is investigated here. In this paper, we present a detailed computational model of magnetic mitigation, along with experimental results that confirm the correctness of the model. Using a strong permanent magnet, it is experimentally shown that, using high enough fields, magnetic mitigation can be a successful method of deflecting ionic debris from an EUV source. For example, through an orifice centered at 0° from the pinch, we saw a flux of 1.65x108 +/- 1.5x107 ions/(m 2*pulse*eV) of 4keV ions without deflection and a negligible flux with deflection. With the orifice at a 35° angle from the pinch, a negligible 4keV flux was seen without deflection. However, with magnetic deflection, a 4keV flux of 1.03x108 +/- 9.4x106 ions/(m 2*pulse*eV) were seen. The half-angle spread of the orifice was .047° with a tolerance of 008°

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography IV
DOIs
StatePublished - Jun 5 2013
EventExtreme Ultraviolet (EUV) Lithography IV - San Jose, CA, United States
Duration: Feb 25 2013Feb 28 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8679
ISSN (Print)0277-786X

Other

OtherExtreme Ultraviolet (EUV) Lithography IV
CountryUnited States
CitySan Jose, CA
Period2/25/132/28/13

Fingerprint

debris
Debris
Ultraviolet
Deflection
deflection
orifices
Extremes
Orifices
Ions
Fluxes
ions
Magnetic Field
Magnetic fields
Angle
Extreme ultraviolet lithography
Extreme Ultraviolet Lithography
Permanent Magnet
neutral particles
pulses
magnetic fields

Keywords

  • Collector
  • Debris
  • Magnetic mitigation
  • Optic

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Elg, D., Sporre, J., Curreli, D., Ruzic, D. N., & Umstadter, K. R. (2013). Magnetic mitigation of debris for EUV sources. In Extreme Ultraviolet (EUV) Lithography IV [86792M] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8679). https://doi.org/10.1117/12.2011519

Magnetic mitigation of debris for EUV sources. / Elg, D.; Sporre, J.; Curreli, D.; Ruzic, D. N.; Umstadter, K. R.

Extreme Ultraviolet (EUV) Lithography IV. 2013. 86792M (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8679).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Elg, D, Sporre, J, Curreli, D, Ruzic, DN & Umstadter, KR 2013, Magnetic mitigation of debris for EUV sources. in Extreme Ultraviolet (EUV) Lithography IV., 86792M, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8679, Extreme Ultraviolet (EUV) Lithography IV, San Jose, CA, United States, 2/25/13. https://doi.org/10.1117/12.2011519
Elg D, Sporre J, Curreli D, Ruzic DN, Umstadter KR. Magnetic mitigation of debris for EUV sources. In Extreme Ultraviolet (EUV) Lithography IV. 2013. 86792M. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2011519
Elg, D. ; Sporre, J. ; Curreli, D. ; Ruzic, D. N. ; Umstadter, K. R. / Magnetic mitigation of debris for EUV sources. Extreme Ultraviolet (EUV) Lithography IV. 2013. (Proceedings of SPIE - The International Society for Optical Engineering).
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