TY - JOUR
T1 - Magnetic field influence on ionization zones in high-power impulse Magnetron Sputtering
AU - Raman, Priya
AU - Cheng, Matthew
AU - Weberski, Justin
AU - Xu, Wenyu
AU - Houlahan, Thomas
AU - Rivera, Jose
AU - Su, Rui
AU - Shchelkanov, Ivan
AU - Ruzic, David
N1 - This research was funded by the NSF Center for Lasers and Plasmas for Advanced Manufacturing under the I/UCRC program grant number 15-40030 . This work was carried out in part in the Frederick Seitz Materials Research Laboratory Central Research Facilities and Visualization Laboratory at Beckman Institute in University of Illinois.
PY - 2018/10
Y1 - 2018/10
N2 - High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Ionized Physical Vapor Deposition (iPVD) technique that is capable of producing high quality, ultra-dense, wear-resistant, low-friction coatings with superior adhesion to the substrate. Despite the deposition of high quality films, HiPIMS suffer from lower deposition rates when compared to DC Magnetron Sputtering (dcMS). The cylindrically symmetric TriPack magnet pack which is the primary focus of this article has demonstrated increased deposition rates in HiPIMS compared to conventional magnet arrangement for the same average power. The observed difference in overall deposition rates, erosion area, voltage-current traces and pulsing parameters influence on deposition rates of TriPack from conventional magnet pack indicates that the plasma dynamics of TriPack is very different from the conventional magnet pack. In order to study the discharge dynamics of the cylindrically symmetric TriPack magnet pack, a gated ICCD camera was used to investigate the moving localized ionization zones in this magnet pack and conventional magnet pack for the same average power. Additionally, a simple HiPIMS ionization zone model was developed to predict the occurrence of ionization zones in TriPack and conventional magnetic field configurations under certain experimental/discharge conditions.
AB - High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Ionized Physical Vapor Deposition (iPVD) technique that is capable of producing high quality, ultra-dense, wear-resistant, low-friction coatings with superior adhesion to the substrate. Despite the deposition of high quality films, HiPIMS suffer from lower deposition rates when compared to DC Magnetron Sputtering (dcMS). The cylindrically symmetric TriPack magnet pack which is the primary focus of this article has demonstrated increased deposition rates in HiPIMS compared to conventional magnet arrangement for the same average power. The observed difference in overall deposition rates, erosion area, voltage-current traces and pulsing parameters influence on deposition rates of TriPack from conventional magnet pack indicates that the plasma dynamics of TriPack is very different from the conventional magnet pack. In order to study the discharge dynamics of the cylindrically symmetric TriPack magnet pack, a gated ICCD camera was used to investigate the moving localized ionization zones in this magnet pack and conventional magnet pack for the same average power. Additionally, a simple HiPIMS ionization zone model was developed to predict the occurrence of ionization zones in TriPack and conventional magnetic field configurations under certain experimental/discharge conditions.
UR - https://www.scopus.com/pages/publications/85049593028
UR - https://www.scopus.com/inward/citedby.url?scp=85049593028&partnerID=8YFLogxK
U2 - 10.1016/j.vacuum.2018.07.008
DO - 10.1016/j.vacuum.2018.07.008
M3 - Article
AN - SCOPUS:85049593028
SN - 0042-207X
VL - 156
SP - 9
EP - 19
JO - Vacuum
JF - Vacuum
ER -