Magnetic field influence on ionization zones in high-power impulse Magnetron Sputtering

Priya Raman, Matthew Cheng, Justin Weberski, Wenyu Xu, Thomas Houlahan, Jose Rivera, Rui Su, Ivan Shchelkanov, David Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Ionized Physical Vapor Deposition (iPVD) technique that is capable of producing high quality, ultra-dense, wear-resistant, low-friction coatings with superior adhesion to the substrate. Despite the deposition of high quality films, HiPIMS suffer from lower deposition rates when compared to DC Magnetron Sputtering (dcMS). The cylindrically symmetric TriPack magnet pack which is the primary focus of this article has demonstrated increased deposition rates in HiPIMS compared to conventional magnet arrangement for the same average power. The observed difference in overall deposition rates, erosion area, voltage-current traces and pulsing parameters influence on deposition rates of TriPack from conventional magnet pack indicates that the plasma dynamics of TriPack is very different from the conventional magnet pack. In order to study the discharge dynamics of the cylindrically symmetric TriPack magnet pack, a gated ICCD camera was used to investigate the moving localized ionization zones in this magnet pack and conventional magnet pack for the same average power. Additionally, a simple HiPIMS ionization zone model was developed to predict the occurrence of ionization zones in TriPack and conventional magnetic field configurations under certain experimental/discharge conditions.

Original languageEnglish (US)
Pages (from-to)9-19
Number of pages11
JournalVacuum
Volume156
DOIs
StatePublished - Oct 2018

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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