Magnetic debris mitigation system for extreme ultraviolet sources

Daniel T. Elg, John R. Sporre, Davide Curreli, Ivan A. Shchelkanov, David N Ruzic, Karl R. Umstadter

Research output: Contribution to journalArticlepeer-review

Abstract

In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris.

Original languageEnglish (US)
Article number013506
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Volume14
Issue number1
DOIs
StatePublished - Jan 1 2015

Keywords

  • collector
  • debris mitigation
  • extreme ultraviolet
  • ionic debris
  • magnetic mitigation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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