Low-voltage 0.1 μm organic transistors and complementary inverter circuits fabricated with a low-cost form of near-field photolithography

John A. Rogers, Ananth Dodabalapur, Zhenan Bao, Howard E. Katz

Research output: Contribution to journalArticlepeer-review

Abstract

This letter describes the combined use of a form of near-field photolithography that relies on a conformable phase masks with microcontact printing and shadow masking for low-cost fabrication of organic transistors and simple complementary inverter circuits with critical dimensions of ∼0.1 μm. The good performance of the devices and their low-voltage operation make them and the fabrication procedures potentially attractive for many applications.

Original languageEnglish (US)
Pages (from-to)1010-1012
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number7
DOIs
StatePublished - Aug 16 1999
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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