Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films

Elham Mohimi, Kinsey Canova, Zhejun Zhang, Sumeng Liu, Justin L. Mallek, Gregory S. Girolami, John R. Abelson

Research output: Contribution to journalArticle

Abstract

Thin films of molybdenum carbonitride, MoC x N y , are deposited by low temperature chemical vapor deposition from Mo(CO) 6 and NH 3 in the temperature range 150-300 °C. At a substrate temperature of 200 °C and Mo(CO) 6 pressure of 0.01 mTorr, the composition varies from MoC 0.48 N 0.20 to MoC 0.36 N 0.33 (i.e., greater nitrogen and less carbon content) upon increasing the ammonia pressure from 0.3 to 3.3 mTorr. At a constant Mo(CO) 6 pressure of 0.01 mTorr and an NH 3 pressure of 2 mTorr, the composition varies from MoC 0.50 N 0.30 to MoC 0.12 N 0.40 with increasing substrate temperature from 150 to 300 °C. Selected films grown at substrate temperatures of 150, 200, and 250 °C are superconducting with critical temperatures of 4.7, 4.5, and 5.2 K, respectively. Grazing incidence x-ray diffraction data indicate that the films are crystalline and isomorphous with the cubic phases of Mo 2 N and Mo 2 C. With a forward-directed flux of precursors toward the surface, film growth is highly conformal in microtrenches of aspect ratio 6, with step coverages of ∼0.85 and 0.80 at growth temperatures of 150 and 200 °C, respectively.

Original languageEnglish (US)
Article number021503
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume37
Issue number2
DOIs
StatePublished - Mar 1 2019

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films'. Together they form a unique fingerprint.

  • Cite this