Low-pressure flame deposition of nanostructured oxide films

Ganesh Skandan; Nick Glumac; Yi Jia Chen; Fredric Cosandey; Eric Heims; Bernard H. Kear

doi:10.1111/j.1151-2916.1998.tb02694.x

Low-pressure flame deposition of nanostructured oxide films

Ganesh Skandan, Nick Glumac, Yi Jia Chen, Fredric Cosandey, Eric Heims, Bernard H. Kear

Research output: Contribution to journal › Article › peer-review

Abstract

A novel process called low-pressure flame deposition (LPFD), which is designed to deposit nanostructured oxide films at high rates, is described. The process involves the pyrolysis of chemical precursors in a flat flame combustor and deposition of an adherent film on suitable substrates. Films with thicknesses of 0.5-10.0 μm at rates in excess of 1 μm/min are formed by condensing nanoparticles from the gas phase and allowing the "superheated" particles to sinter on the substrate. Either porous or dense films, with nanoscale features in both cases, are formed by altering the processing parameters such as temperature of the substrate and the flame temperature profile. The paper describes the processing parameters and microstructures of SiO₂ and SnO₂ films formed via the LPFD process.

Original language	English (US)
Pages (from-to)	2753-2756
Number of pages	4
Journal	Journal of the American Ceramic Society
Volume	81
Issue number	10
DOIs	https://doi.org/10.1111/j.1151-2916.1998.tb02694.x
State	Published - Oct 1998
Externally published	Yes

ASJC Scopus subject areas

Ceramics and Composites
Materials Chemistry

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10.1111/j.1151-2916.1998.tb02694.x

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AU - Cosandey, Fredric

AU - Heims, Eric

AU - Kear, Bernard H.

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Low-pressure flame deposition of nanostructured oxide films

Abstract

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