A novel process called low-pressure flame deposition (LPFD), which is designed to deposit nanostructured oxide films at high rates, is described. The process involves the pyrolysis of chemical precursors in a flat flame combustor and deposition of an adherent film on suitable substrates. Films with thicknesses of 0.5-10.0 μm at rates in excess of 1 μm/min are formed by condensing nanoparticles from the gas phase and allowing the "superheated" particles to sinter on the substrate. Either porous or dense films, with nanoscale features in both cases, are formed by altering the processing parameters such as temperature of the substrate and the flame temperature profile. The paper describes the processing parameters and microstructures of SiO2 and SnO2 films formed via the LPFD process.
|Original language||English (US)|
|Number of pages||4|
|Journal||Journal of the American Ceramic Society|
|State||Published - Oct 1998|
ASJC Scopus subject areas
- Ceramics and Composites
- Materials Chemistry