Low loss high mesa optical waveguides based on InGaAsP/InP heterostructures

W. S. Choi, J. H. Jang, B. A. Yu, Y. L. Lee, W. Zhao, J. W. Bae, I. Adesida

Research output: Contribution to journalArticlepeer-review

Abstract

Low loss high mesa optical waveguides were fabricated on InGaAsP/InP heterostructures by utilizing inductively-coupled-plasma reactive ion etching (ICP-RIE) and electron beam lithography technique. The fabrication process was optimized by measuring sidewall roughness of deep-etched wave-guides. Atomic force microscope loaded with carbon nanotude was used to obtain three-dimensional image of the etched sidewall of waveguides. The obtained statistical information such as rms roughness and correlation length was used to theoretically calculate scattering loss of waveguides. Several waveguides with different number of sharp bends and the length were fabricated and their propagation losses were measured by modified Fabry-Perot method. The measured propagation losses were compared with theoretically calculated losses.

Original languageEnglish (US)
Pages (from-to)3562-3566
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume6
Issue number11
DOIs
StatePublished - Nov 1 2006

Keywords

  • Atomic force microscope
  • Fabry-Perot loss measurement
  • Integrated optics
  • Scattering loss
  • Semiconductor optical waveguide
  • Sidewall roughness (SWR)

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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