Low energy electron microscopy studies of steps on single crystal thin films of refractory metals

M. Ondrejcek; W. Swiech; G. Yang; C. P. Flynn

doi:10.1116/1.1521958

Low energy electron microscopy studies of steps on single crystal thin films of refractory metals

M. Ondrejcek, W. Swiech, G. Yang, C. P. Flynn

National Center for Supercomputing Applications (NCSA)

Research output: Contribution to journal › Article › peer-review

Abstract

The low energy electron microscopy (LEEM) at the University of Illinois has been in service for four years. This paper discusses a research project that occupies about half the effort on the machine. It focuses on the properties of refractory metals at elevated temperatures, and particularly the surface and bulk behavior of epitaxial thin films grown by molecular beam epitaxy.

Original language	English (US)
Pages (from-to)	2473-2477
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1521958
State	Published - Nov 2002

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

Online availability

10.1116/1.1521958

Library availability

Discover UIUC Full Text

Cite this

@article{2b4a6301269c4292acb86d4fcc137651,

title = "Low energy electron microscopy studies of steps on single crystal thin films of refractory metals",

abstract = "The low energy electron microscopy (LEEM) at the University of Illinois has been in service for four years. This paper discusses a research project that occupies about half the effort on the machine. It focuses on the properties of refractory metals at elevated temperatures, and particularly the surface and bulk behavior of epitaxial thin films grown by molecular beam epitaxy.",

author = "M. Ondrejcek and W. Swiech and G. Yang and Flynn, {C. P.}",

year = "2002",

month = nov,

doi = "10.1116/1.1521958",

language = "English (US)",

volume = "20",

pages = "2473--2477",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "0734-211X",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Low energy electron microscopy studies of steps on single crystal thin films of refractory metals

AU - Ondrejcek, M.

AU - Swiech, W.

AU - Yang, G.

AU - Flynn, C. P.

PY - 2002/11

Y1 - 2002/11

N2 - The low energy electron microscopy (LEEM) at the University of Illinois has been in service for four years. This paper discusses a research project that occupies about half the effort on the machine. It focuses on the properties of refractory metals at elevated temperatures, and particularly the surface and bulk behavior of epitaxial thin films grown by molecular beam epitaxy.

AB - The low energy electron microscopy (LEEM) at the University of Illinois has been in service for four years. This paper discusses a research project that occupies about half the effort on the machine. It focuses on the properties of refractory metals at elevated temperatures, and particularly the surface and bulk behavior of epitaxial thin films grown by molecular beam epitaxy.

UR - http://www.scopus.com/inward/record.url?scp=0036883195&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036883195&partnerID=8YFLogxK

U2 - 10.1116/1.1521958

DO - 10.1116/1.1521958

M3 - Article

AN - SCOPUS:0036883195

SN - 0734-211X

VL - 20

SP - 2473

EP - 2477

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Low energy electron microscopy studies of steps on single crystal thin films of refractory metals

Abstract

ASJC Scopus subject areas

Online availability

Library availability

Related links

Fingerprint

Cite this