Abstract
The properties of metamorphic materials, fabrication process of photodiodes, and device results on long-wavelength InGaAs photodetectors with low leakage current and large bandwidth are presented. The metamorphic device layers are grown on GaAs substrates using a linearly-graded buffer layer to expand the lattice constant. The indium content in the layer is gradually increased and that of galllium is gradually decreased form the GaAs substrate to In0.52Al0.48As which is lattice-matched to InP.
Original language | English (US) |
---|---|
Pages (from-to) | 919-920 |
Number of pages | 2 |
Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
Volume | 2 |
State | Published - Dec 9 2003 |
Event | 2003 IEEE LEOS Annual Meeting Conference Proceedings - TUCSON, AZ, United States Duration: Oct 26 2003 → Oct 30 2003 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering