Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell

Zhida Xu, Jing Jiang, Gang Logan Liu

Research output: Contribution to journalArticlepeer-review

Abstract

A high-density and -uniformity sub-100 nm surface-oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on a photovoltaic device surface by a onestep high-throughput plasma-enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short-circuit current increased by 7.1%, fill factor increased by 7.0%, and conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low-cost and high-throughput nanomanufacturing technology.

Original languageEnglish (US)
Pages (from-to)4430-4435
Number of pages6
JournalApplied Optics
Volume51
Issue number19
DOIs
StatePublished - Jul 1 2012

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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