Laser photochemical deposition of germanium-silicon alloy thin films

Keyphrases

• Chemical Vapor Deposition 100%
• Alloy Thin Films 100%
• Si2H6 100%
• Laser Photolysis 100%
• Silicon-germanium Alloy 100%
• Photochemical Deposition 100%
• Germanium 50%
• GeSn Alloy 50%
• SiGe 50%
• Film Growth 50%
• Raman Spectroscopy 50%
• Photolysis 50%
• Gas Phase 50%
• Partial Pressure 50%
• Gas Mixture 50%
• Substrate Temperature 50%
• Film Composition 50%
• Film Stoichiometry 50%
• ArF Laser 50%
• Auger Analysis 50%

Engineering

• Thin Films 100%
• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Reactant 50%
• Gas-Phase 50%
• Partial Pressure 50%
• Substrate Temperature 50%
• Reaction Stoichiometry 50%
• Gas Mixture 50%

Material Science

• Thin Films 100%
• Si-Ge Alloys 100%
• Photolysis 100%
• Film 66%
• Chemical Vapor Deposition 66%
• Silicon 33%
• Germanium 33%
• Film Growth 33%
• Raman Spectroscopy 33%
• Gas Mixture 33%