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Laser chemical vapor deposition of Ti from TiBr
4
W. B. Chou,
M. N. Azer
, J. Mazumder
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peer-review
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4
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Keyphrases
Auger Electron Spectroscopy
33%
Chamber Temperature
33%
Chemical Vapor Deposition
33%
CO2 Laser
33%
Deposition Rate
100%
Film Deposition
33%
Film Thickness
33%
Irradiation Time
33%
Laser Chemical Vapor Deposition
100%
Order of Magnitude
33%
Partial Vapor Pressure
33%
Pure Titanium
33%
Scanning Electron Microscopy
33%
Stainless Steel Substrate
33%
Stylus Profilometry
33%
TEM00
33%
Titanium Film
33%
Titanium Metal
33%
Material Science
Auger Electron Spectroscopy
33%
Carbon Dioxide
33%
Chemical Vapor Deposition
100%
Film
100%
Film Deposition
33%
Film Thickness
33%
Scanning Electron Microscopy
33%
Stainless Steel
33%
Titanium
66%
Chemical Engineering
Chemical Vapor Deposition
100%
Deposition Rate
100%
Profilometry
33%
Vapor Deposition
100%
Engineering
Chemical Vapor Deposition
33%
Deposition Rate
100%
Laser Chemical Vapor Deposition
100%
Pure Titanium
33%
Stainless Steel
33%
Vapor Deposition
33%