Laser chemical vapor deposition of Ti from TiBr4

W. B. Chou; M. N. Azer; J. Mazumder

doi:10.1063/1.343903

Laser chemical vapor deposition of Ti from TiBr₄

W. B. Chou, M. N. Azer, J. Mazumder

Research output: Contribution to journal › Article › peer-review

Abstract

Titanium metal has been deposited on a stainless-steel substrate by decomposing TiBr₄ with a 1.4-kW cw TEM₀₀ CO₂ laser. Both the film thickness and deposition rate of the films have been studied as a function of partial vapor pressure of TiBr₄, irradiation time, and chamber temperature. The observed deposition rate (190 μm/h) was two orders of magnitude greater than the deposition rate calculated for the production of pure titanium films using chemical vapor deposition. In addition, the films have been analyzed by Auger electron spectroscopy, scanning electron microscopy, and stylus profilometry, and these results show that the coatings are relatively pure (90%) and uniform.

Original language	English (US)
Pages (from-to)	191-195
Number of pages	5
Journal	Journal of Applied Physics
Volume	66
Issue number	1
DOIs	https://doi.org/10.1063/1.343903
State	Published - 1989
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

Online availability

10.1063/1.343903

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Cite this

@article{a54e4c42105641dfa44d8909daeea08a,

title = "Laser chemical vapor deposition of Ti from TiBr4",

abstract = "Titanium metal has been deposited on a stainless-steel substrate by decomposing TiBr4 with a 1.4-kW cw TEM00 CO2 laser. Both the film thickness and deposition rate of the films have been studied as a function of partial vapor pressure of TiBr4, irradiation time, and chamber temperature. The observed deposition rate (190 μm/h) was two orders of magnitude greater than the deposition rate calculated for the production of pure titanium films using chemical vapor deposition. In addition, the films have been analyzed by Auger electron spectroscopy, scanning electron microscopy, and stylus profilometry, and these results show that the coatings are relatively pure (90%) and uniform.",

author = "Chou, {W. B.} and Azer, {M. N.} and J. Mazumder",

year = "1989",

doi = "10.1063/1.343903",

language = "English (US)",

volume = "66",

pages = "191--195",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "1",

}

TY - JOUR

T1 - Laser chemical vapor deposition of Ti from TiBr4

AU - Chou, W. B.

AU - Azer, M. N.

AU - Mazumder, J.

PY - 1989

Y1 - 1989

N2 - Titanium metal has been deposited on a stainless-steel substrate by decomposing TiBr4 with a 1.4-kW cw TEM00 CO2 laser. Both the film thickness and deposition rate of the films have been studied as a function of partial vapor pressure of TiBr4, irradiation time, and chamber temperature. The observed deposition rate (190 μm/h) was two orders of magnitude greater than the deposition rate calculated for the production of pure titanium films using chemical vapor deposition. In addition, the films have been analyzed by Auger electron spectroscopy, scanning electron microscopy, and stylus profilometry, and these results show that the coatings are relatively pure (90%) and uniform.

AB - Titanium metal has been deposited on a stainless-steel substrate by decomposing TiBr4 with a 1.4-kW cw TEM00 CO2 laser. Both the film thickness and deposition rate of the films have been studied as a function of partial vapor pressure of TiBr4, irradiation time, and chamber temperature. The observed deposition rate (190 μm/h) was two orders of magnitude greater than the deposition rate calculated for the production of pure titanium films using chemical vapor deposition. In addition, the films have been analyzed by Auger electron spectroscopy, scanning electron microscopy, and stylus profilometry, and these results show that the coatings are relatively pure (90%) and uniform.

UR - http://www.scopus.com/inward/record.url?scp=36549100531&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=36549100531&partnerID=8YFLogxK

U2 - 10.1063/1.343903

DO - 10.1063/1.343903

M3 - Article

AN - SCOPUS:36549100531

SN - 0021-8979

VL - 66

SP - 191

EP - 195

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -