Large-area diamond film growth in a low-pressure flame

N. G. Glumac; D. G. Goodwin

doi:10.1016/0167-577X(93)90109-B

Large-area diamond film growth in a low-pressure flame

Research output: Contribution to journal › Article › peer-review

Abstract

Chemical vapor deposition of a large-area (13 cm²) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.

Original language	English (US)
Pages (from-to)	119-122
Number of pages	4
Journal	Materials Letters
Volume	18
Issue number	3
DOIs	https://doi.org/10.1016/0167-577X(93)90109-B
State	Published - Dec 1993
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1016/0167-577X(93)90109-B

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title = "Large-area diamond film growth in a low-pressure flame",

abstract = "Chemical vapor deposition of a large-area (13 cm2) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.",

author = "Glumac, {N. G.} and Goodwin, {D. G.}",

year = "1993",

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language = "English (US)",

volume = "18",

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journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

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T1 - Large-area diamond film growth in a low-pressure flame

AU - Glumac, N. G.

AU - Goodwin, D. G.

PY - 1993/12

Y1 - 1993/12

N2 - Chemical vapor deposition of a large-area (13 cm2) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.

AB - Chemical vapor deposition of a large-area (13 cm2) polycrystalline diamond film by a low-pressure combustion technique has been demonstrated. Good film quality and uniformity are observed, and the technique offers several advantages over other large-area deposition methods, including simple scalability up to arbitrarily large substrates.

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U2 - 10.1016/0167-577X(93)90109-B

DO - 10.1016/0167-577X(93)90109-B

M3 - Article

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SP - 119

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JO - Materials Letters

JF - Materials Letters

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Large-area diamond film growth in a low-pressure flame

Abstract

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