Kinetics of radiation-induced segregation in Ni-12.7 at.% Si

R. S. Averback, L. E. Rehn, W. Wagner, H. Wiedersich, P. R. Okamoto

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The kinetics of radiation-induced segregation in Ni-12.7 at.% Si alloys was investigated using in situ, simultaneous Rutherford-backscattering spectrometry. It was observed that a precipitate layer of -Ni3Si grew at the specimen surface during 2.0-MeV He and 2.75-MeV Li irradiations. The thickness of the layer was measured as a function of dose, dose rate, and temperature. For all of the irradiation conditions the layer thickness grew proportionately to the square root of dose. The proportionality constant, or growth-rate constant, was dependent on temperature and dose rate. Below 570°C the growth-rate constant displayed Arrhenius behavior with an apparent activation enthalpy of 0.30±0.04 eV, and it depended approximately on the -14th power of the dose rate. Above 590°C the growth-rate constant also displayed Arrhenius behavior but with an apparent activation enthalpy of -0.75±0.15 eV; moreover, it was independent of dose rate in this temperature regime. A simple model for radiation-induced segregation is described which relates the segregation results to high-temperature point-defect properties in alloys. It shows that the apparent activation enthalpy of the growth-rate constant at low temperatures is equal to 14 the enthalpy of vacancy migration, and that at high temperatures it is equal to -12 the enthalpy of vacancy formation. The model also correctly predicts the observed dose-rate dependences of the growth-rate constant in the two temperature regimes.

Original languageEnglish (US)
Pages (from-to)3100-3109
Number of pages10
JournalPhysical Review B
Issue number6
StatePublished - 1983
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics


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