Ka-band monolithic amplifier using 0·5 μm gate length Ion-Implanted GaAs/AlGaAs heterojunction fet technology

T. Hwang, M. Feng, C. L. Lau

Research output: Contribution to journalArticlepeer-review

Abstract

Monolithic, two-stage amplifiers using 0·5 × 80 μm2 gate GaAs/AIGaAs heterojunction FETs have been developed for Ka-band operation. These monolithic two-stage amplifiers were fabricated using ion implantation for the active layer and optical lithography for the 0·5 μm gate length. MMIC two-stage amplifiers achieved average gains of 12·6 ± 1·4dB at 30 GHz and 8·8 ± 2·0dB at 40 GHz, respectively, for all 39 sites across a 3 inch diameter wafer. These are the first reported results the MMIC two-stage amplifiers using 0·5 μm gate length ion-implanted GaAs/AIGaAs heterojunction FETs achieved over 10 dB gain at Ka band.

Original languageEnglish (US)
Pages (from-to)2121-2122
Number of pages2
JournalElectronics Letters
Volume27
Issue number23
DOIs
StatePublished - Oct 24 1991

Keywords

  • Amplifiers
  • Integrated circuits
  • Microwave circuits
  • Microwave devices and components

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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