Is your layout-density verification exact?A fast exact deep submicrometer density calculation algorithm

Hua Xiang, Kai Yuan Chao, Ruchir Puri, Martin D.F. Wong

Research output: Contribution to journalArticle

Abstract

As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask-layout uniformity/evenness is highly desired, and it is usually measured by the feature densities within defined feasible ranges determined by the manufacturing-process design rules. To address the density-control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum/minimum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/long hours to a few minutes/seconds. Moreover, it is even faster than the existing approximate algorithms in the literature.

Original languageEnglish (US)
Article number4475259
Pages (from-to)621-632
Number of pages12
JournalIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Volume27
Issue number4
DOIs
StatePublished - Apr 1 2008

Keywords

  • Density
  • Design for manufacturability (DFM)
  • Fix-dissection

ASJC Scopus subject areas

  • Software
  • Computer Graphics and Computer-Aided Design
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Is your layout-density verification exact?A fast exact deep submicrometer density calculation algorithm'. Together they form a unique fingerprint.

  • Cite this