Is your layout density verification exact? A fast exact algorithm for density calculation

Hua Xiang, Kai Yuan Chao, Ruchir Puri, Martin D.F. Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature.

Original languageEnglish (US)
Title of host publicationProceedings of ISPD'07
Subtitle of host publication2007 International Symposium on Physical Design
Pages19-26
Number of pages8
DOIs
StatePublished - Oct 2 2007
EventISPD'07: 2007 International Symposium on Physical Design - Austin, TX, United States
Duration: Mar 18 2007Mar 21 2007

Publication series

NameProceedings of the International Symposium on Physical Design

Other

OtherISPD'07: 2007 International Symposium on Physical Design
Country/TerritoryUnited States
CityAustin, TX
Period3/18/073/21/07

Keywords

  • DFM
  • Density
  • Fix-dissection

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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