Ionic debris assessment of various EUVL systems

C. H. Castano, David N Ruzic, S. N. Srivastava, K. C. Thompson, J. Sporre

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Debris generation in EUV sources is a real threat to the lifetime of collector optics. Debris measurements in these sources are of immense importance to enable source suppliers to estimate collector lifetime. Ion debris measurements performed so far are not consistent and in part incomplete. To verify lifetime claims from different EUV source suppliers, SEMATECH, which is leading this investigation, has collaborated with and provided funding to the Center for Plasma Material Interactions (CPMI) at the University of Illinois to build a fully calibrated and standardized spherical sector electrostatic energy analyzer (ICE). This device is capable of measuring ion debris flux in absolute units. In addition to ion flux, the detector is also capable of identifying different ion species present in the plasma, which can be discriminated based on energy-to-charge ratio. The lifetime of collector optics is calculated using the measured ion flux. This device was fabricated for SEMATECH with the sole aim of traveling to different EUV source suppliers' sites around the world and collecting ion debris data. SEMATECH has measured ion debris from different EUV sources around the world, using a 1 to 14keV ion energy range under different source operational conditions (chamber pressure, pinch frequency, pinch power, angle). These measurements identify the need for debris mitigation in all the EUV sources investigated under this project. They also give source suppliers an opportunity to improve and optimize the performance of their respective sources. The information on absolute ion fluxes is an advantage to source suppliers, allowing them to design and develop effective debris mitigation schemes, which can again be tested for their effectiveness using the ion diagnostic tool. As the debris consists of ions and neutrals, the next logical step is to develop a standardized neutral detector to measure the flux and energy distribution of neutrals present in EUV plasma sources. Taking into account both ions and neutral fluxes, more definitive conclusions on the performance of a EUV source can be made and better collector lifetime estimation models can be derived. The Illinois Calibrated ESA (ICE) tool is now part of the SEMATECH "Flying Circus" equipment set.

Original languageEnglish (US)
Title of host publicationEmerging Lithographic Technologies XII
DOIs
StatePublished - Dec 1 2008
EventEmerging Lithographic Technologies XII - San Jose, CA, United States
Duration: Feb 26 2008Feb 28 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6921
ISSN (Print)0277-786X

Other

OtherEmerging Lithographic Technologies XII
CountryUnited States
CitySan Jose, CA
Period2/26/082/28/08

Fingerprint

EUV Source
Extreme ultraviolet lithography
Extreme Ultraviolet Lithography
debris
Debris
Ions
Lifetime
ions
Fluxes
Plasma
accumulators
Optics
life (durability)
Energy
Detector
Energy Distribution
European Space Agency
Electrostatics
Diagnostics
Sector

Keywords

  • Diagnostic
  • ESA
  • EUV
  • Flux
  • Ion debris measurement

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Castano, C. H., Ruzic, D. N., Srivastava, S. N., Thompson, K. C., & Sporre, J. (2008). Ionic debris assessment of various EUVL systems. In Emerging Lithographic Technologies XII [692137] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). https://doi.org/10.1117/12.774156

Ionic debris assessment of various EUVL systems. / Castano, C. H.; Ruzic, David N; Srivastava, S. N.; Thompson, K. C.; Sporre, J.

Emerging Lithographic Technologies XII. 2008. 692137 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Castano, CH, Ruzic, DN, Srivastava, SN, Thompson, KC & Sporre, J 2008, Ionic debris assessment of various EUVL systems. in Emerging Lithographic Technologies XII., 692137, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6921, Emerging Lithographic Technologies XII, San Jose, CA, United States, 2/26/08. https://doi.org/10.1117/12.774156
Castano CH, Ruzic DN, Srivastava SN, Thompson KC, Sporre J. Ionic debris assessment of various EUVL systems. In Emerging Lithographic Technologies XII. 2008. 692137. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.774156
Castano, C. H. ; Ruzic, David N ; Srivastava, S. N. ; Thompson, K. C. ; Sporre, J. / Ionic debris assessment of various EUVL systems. Emerging Lithographic Technologies XII. 2008. (Proceedings of SPIE - The International Society for Optical Engineering).
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