TY - GEN
T1 - Ion Cyclotron Resonance Heating on Proto-MPEX
AU - Piotrowicz, Pawel A.
AU - Ruzic, David N.
AU - Caneses, Juan F.
AU - Caughman, John B.O.
AU - Goulding, Richard H.
AU - Green, David L.
AU - Lore, Jeremy D.
AU - Rapp, Juergen
N1 - Publisher Copyright:
© 2018 IEEE.
PY - 2018/6/24
Y1 - 2018/6/24
N2 - The source technology for the Plasma Materials Exposure eXperiment (MPEX) is currently being developed on the Proto-MPEX device at Oak Ridge National Laboratory1 to study fusion relevant plasma material interactions on a linear plasma machine. Radio frequency (RF) technology is used for the source and heating of the plasma on Proto-MPEX. A helicon plasma source, powered with> 100 kW of RF power at 13.56 MHz, produces a steady state plasma with peak electron density of> 6e19 m-3, Additional RF heating sources include Electron Bernstein Waves to heat the electrons to temperatures > 15 e V, as well as ion cyclotron resonance heating (ICRH) to heat ions to temperatures> 20 eV.
AB - The source technology for the Plasma Materials Exposure eXperiment (MPEX) is currently being developed on the Proto-MPEX device at Oak Ridge National Laboratory1 to study fusion relevant plasma material interactions on a linear plasma machine. Radio frequency (RF) technology is used for the source and heating of the plasma on Proto-MPEX. A helicon plasma source, powered with> 100 kW of RF power at 13.56 MHz, produces a steady state plasma with peak electron density of> 6e19 m-3, Additional RF heating sources include Electron Bernstein Waves to heat the electrons to temperatures > 15 e V, as well as ion cyclotron resonance heating (ICRH) to heat ions to temperatures> 20 eV.
UR - http://www.scopus.com/inward/record.url?scp=85118957790&partnerID=8YFLogxK
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U2 - 10.1109/ICOPS35962.2018.9575342
DO - 10.1109/ICOPS35962.2018.9575342
M3 - Conference contribution
AN - SCOPUS:85118957790
T3 - IEEE International Conference on Plasma Science
BT - ICOPS 2018 - 45th IEEE International Conference on Plasma Science
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 45th IEEE International Conference on Plasma Science, ICOPS 2018
Y2 - 24 June 2018 through 28 June 2018
ER -