Introduction to photolithography: Preparation of microscale polymer silhouettes

Kimberly L. Berkowski; Kyle N. Plunkett; Qing Yu; Jeffrey S. Moore

doi:10.1021/ed082p1365

Introduction to photolithography: Preparation of microscale polymer silhouettes

Kimberly L. Berkowski, Kyle N. Plunkett, Qing Yu, Jeffrey S. Moore

Research output: Contribution to journal › Article › peer-review

Abstract

A laboratory experiment describes a simplified version of the generic process of photolithography. In the experiment, a glass slide is substituted for the silicon wafer and a prepolymer solution containing monomer (IBA), crosslinker (bis-GMA), and photoinitiator (DMPA) acts as the photoresist. The photomask is a transparency film containing the negative of a computer-generated image and the light source is a handheld UV lamp. This laboratory allows the visualization of photolithography, while demonstrating important concepts in polymer chemistry.

Original language	English (US)
Pages (from-to)	1365-1369
Number of pages	5
Journal	Journal of Chemical Education
Volume	82
Issue number	9
DOIs	https://doi.org/10.1021/ed082p1365
State	Published - Sep 2005

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Chemistry(all)
Education

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10.1021/ed082p1365

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Introduction to photolithography: Preparation of microscale polymer silhouettes

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