Introduction to photolithography: Preparation of microscale polymer silhouettes

Kimberly L. Berkowski, Kyle N. Plunkett, Qing Yu, Jeffrey S. Moore

Research output: Contribution to journalArticlepeer-review


A laboratory experiment describes a simplified version of the generic process of photolithography. In the experiment, a glass slide is substituted for the silicon wafer and a prepolymer solution containing monomer (IBA), crosslinker (bis-GMA), and photoinitiator (DMPA) acts as the photoresist. The photomask is a transparency film containing the negative of a computer-generated image and the light source is a handheld UV lamp. This laboratory allows the visualization of photolithography, while demonstrating important concepts in polymer chemistry.

Original languageEnglish (US)
Pages (from-to)1365-1369
Number of pages5
JournalJournal of Chemical Education
Issue number9
StatePublished - Sep 2005

ASJC Scopus subject areas

  • Chemistry(all)
  • Education


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