Abstract
A laboratory experiment describes a simplified version of the generic process of photolithography. In the experiment, a glass slide is substituted for the silicon wafer and a prepolymer solution containing monomer (IBA), crosslinker (bis-GMA), and photoinitiator (DMPA) acts as the photoresist. The photomask is a transparency film containing the negative of a computer-generated image and the light source is a handheld UV lamp. This laboratory allows the visualization of photolithography, while demonstrating important concepts in polymer chemistry.
Original language | English (US) |
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Pages (from-to) | 1365-1369 |
Number of pages | 5 |
Journal | Journal of Chemical Education |
Volume | 82 |
Issue number | 9 |
DOIs | |
State | Published - Sep 2005 |
ASJC Scopus subject areas
- Chemistry(all)
- Education