A laboratory experiment describes a simplified version of the generic process of photolithography. In the experiment, a glass slide is substituted for the silicon wafer and a prepolymer solution containing monomer (IBA), crosslinker (bis-GMA), and photoinitiator (DMPA) acts as the photoresist. The photomask is a transparency film containing the negative of a computer-generated image and the light source is a handheld UV lamp. This laboratory allows the visualization of photolithography, while demonstrating important concepts in polymer chemistry.
|Original language||English (US)|
|Number of pages||5|
|Journal||Journal of Chemical Education|
|State||Published - Sep 2005|
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